Photographic element with polymer film support

ABSTRACT

Novel monomers of 7,7-dimethyl-7H-dibenzo (c,h) -xanthene-5,9disulfonyl halide (chloride) and novel high molecular weight polymers containing 7,7-dimethyl-7H-dibenzo-(c,h) xanthene residues are useful in the preparation of photographic film bases.

United States Patent [191 Hamb et al. 1 Sept. 2, 1975 [54] PHOTOGRAPHIC ELEIWENT W'ITH 3.657.185 4/1972 Wear 160/47 C POLYNIER FlLNl SUPPORT 3.658.757 4/l972 Conix ct al. 260/49 Inventors: Frederick D. Hamb: John C. Wilson,

both of Rochester, N.Y.

Eastman Kodak Company. Rochester, NY.

Filed: Dec. 13. 1973 Appl. No.: 424.483

Related U.S. Application Data 33l.l34. Feb. 9.

Assignec:

Division of Scr. No. 1973.

abandoned.

U.S. Cl. 96/87 R: ll7/l38.8 R; ll7/l38.8 F;

ll7/l38.8 D; 260/335 R Int. Cl.- G03C 1/78 Field of Search 96/87 R References Cited UNITED STATES PATENTS 7/l97l Kwolek 260/49 OTHER PUBLICATIONS Hamb. F. L. et al.. Def. Pub. of Ser. No. 141.398 filed May 7. 197i. published 8960.6.422 on Mar. 14. 1972. Def. Pub. No. T896934.

Primary lit'umim'r-Ronald H. Smith AIIUI'IM). Agent. 0: Firm-A. H. Rosenstein 11 Claims. N0 Drawings PHOTOGRAPHIC ELEMENT WITH POLYMER FILM SUPPORT This application is a division of US. Ser. No. 33l.134. filed Feb. 9. l973 now abandoned of which US. application Ser. No. 452.299 filed Mar. 18. 1974 is a continuation application now issued as US. Pat. 3.859.254 issued Jan. 7. 1975. US. Ser. No. 331.134 is a continuation-in-part of US. Ser. No. l58,525, filed June 30, i971 now abandoned.

FIELD OF THE. INVENTION This invention relates generally to novel monomers and to novel film-forming. polymeric compounds prepared by condensation reactions. and more particularly to novel film-forming. linear condensation polymers comprising residues of a bifunctional derivative of 7.7-dimethyl-7H-dibenzo[ c.hl xanthene which polymers are used as supports for photographic emulsions.

BACKGROUND OF THE lNVENTlON There is a continuing demand for low cost filmbrming materials with improved physical properties which can be used as supports for photographic elements. Currently available film-forming compositions that retain good physical characteristics at temperatures above about 200C have not found general acceptance because their manufacture involves expensive materials or difficult procedures.

SUMMARY OF THE INVENTION It is therefore an object of this invention to provide a novel class of linear condensation polymers and copolymers comprising the residue of condensation polymers and copolymers comprising residues of a bifunctional 7.7-dimethyl-7H -dibenzo[c.h]xanthenc which have improved physical properties such as high glass transition temperatures (Tg) and dimensional stability. Another object of this invention is to provide novel linear condensation polymers incorporating the residue of a bifunctional 7. 7-dimethyl-7H-dibenzo [c.h-lxanthcne that can be readily prepared by existing procedures and technology. A further objectis to provide novel filmforming linear polyesters. polysulfonamides. polysulfonates'. polyester-polysulfonates. and polyurethanes and many other interpolymers comprising 7,7-dimethyl-5.9-7H-dibenzo [c.h]xanthylene units useful as supports for photographic elements that are subjected to high temperature processing. Yet. another object is to provide novel-photographic elements comprising an improved support material.

These and other objects and advantages of this invention are obtained from a novel class of film-forming condensation polymers with improved physical properties which comprises residues of a bifunctional 7.7-

dimethyl-7H-dibenzo[e.hlxanthene having the formula I:

R is an alkylene radical. cycloalkylenebisalkylene radical. or arylenebisalkylene radical. R is hydrogen. alkyl radical. aralkyl radical or aryl radical.

Useful members of the novel class of polymers of this invention include polyesters. copolyestcrs. polysulfonamidcs. copolysulfonamides. polysulfonates. copolysulfonates. polyester-polysulfonates. and polyurethanes. Generally any material containing functional groups reactive with difunctional units of 7.7-dimethyl-7H- dibenzo {c.hlxanthenc may be copolymerized herein. The preferred polymers comprise polyesters. copolyestcrs. polysulfonamides. copolymers of sulfonamides. polysulfonates and polyester-polysulfonates.

In one aspect. linear. condensation polymer films made according to this invention can be solvent cast. treated to improve the adhesion of subsequent coatings and coated with photographic compositions. The polymers have improved physical properties such as highglass transition temperatures. chemical and physical stability at high temperature and good flexibility and can be prepared from low-cost starting materials. The resulting photographic elements can be processed at temperatures in excess of 200C. preferably above at least 220C. with very little effect on dimensional stability of the element.

A preferred embodiment according to this invention relates to linear polyester materials comprising diearboxylie units of four or more carbon atoms esterified with diol units comprising 7.7-dimethyl7H- dibenzolc.h]xanthene-5.9-diol. The preferred polymers comprise units of 7.7-dimethyl7H-dibenzo- [c.hlxanthene-SS-diyl.

Another preferred embodiment relates to linear polysulfonate materials comprising diol units condensed with 7.7-dimethyl-7H-dibenzo[ c.h lxanthene-5.9- disulfonyl halide units.

Another preferred embodiment relates to linear polysulfonamide materials comprising diamine units reacted with 7.7-dimethyl-7H-dibenzoIc.h lxanthene-5.9 disulfonyl halide units.

A further preferred embodiment relates to linear polyester materials comprising diearboxylic units of four or more carbon atoms esterified with diol units comprising 7,7-dimethyl-7HdibenzoIc,hlxanthene- Y is 5,9-diol units and units of a dissimilar diol.

Another preferred embodiment relates to linear polvester-polysulfonate materials comprising diol units R] condensed with bist 4-carboniethoxyphenyl )7 7- 5 ;L ;L

dimethyl-7H-dibenxol c.h ]xanthene-5.)-disulfonate Unilfior SO;,R"O when X is $0 or A still further preferred embodiment relates to linear polysulfonate materials comprising diol units eondensed \vith sulfonvl halide units comprising 7.7- in dimeth vl-7Hdibenzo[c.hl-xanthene-S.Q-disulfonyl so. halide units and units of a dissimilar sulfonyl halide.

Other useful polymers of this invention include linear polyester materials comprising 7.7-dimethyl-7H- .hcn X is diben7.o[c h lxanthene-iQ-diol units esterificd with units of a dicarboxvlic compound of four or more carbon atoms and in copolymerized relationship therewith units of one or more dissimilar diols with units of one so or more dissimilar dicarboxylic compounds of four or v I more carbon atoms. Similarly. still other desirable poly- 3o mers according to this invention include polysulfonate and III materials comprising 7,7-dimethyl-7H- wherein X is O and Y is diben2o[e.hlxanthene-5'.'-)-disulfonyl halide units condensed with diol units. said polysulfonates having in co- 1: polymerized relationship therewith units of one. or more dissimilar disulton vl halides with units of one or R'- more dissimilar diols.

This invention also contemplates polymers comprisin g 7.7-dimethyl-7H-dibenxo [c.hlxanthene 5,9-diol R is a radical selected from the group consisting of units condensed with sulfonate and carboxylic ester 40 alkylene radicals of from 2 to 12 carbon atoms, preferunits. ably from 2 to 6 carbon atoms, such as ethylene, tri- This invention also contemplates novel monomers methyleneybutylcnc, hexylene,oetylene, decylene and comprising the 5,9-disulfonyl halide derivative of 7,7- the like; cycloalkylenebisalkylene radicals, such as 1,4-

' dimethyl-7H-dibenzolc.hlxanthene and methods of 4 eyelohexylenedimethylene, 7 1,4-

cyclohexylenediethylene and the like; and arylenebipreparing samev The preferred halide is the chloride.

' salkylene radicals, such as l,4-phenylenedimethylene.

1,4-phenylenediethylene and the like. Each R, which can be the same or different, is a radical selected from The polymers of this invention include 7,7-dimethylthe group consisting of hydrogen atoms, alkyl radicals 7H-dibenzo[c,hIxanthene residue and the polymers are of from I to 4 carbon atoms; aralkyl radicals, such as represented by formulas H and Ill: benzyl or phenethyl; and aryl radicals, such as phenyl,

including substituted phenyl, such as tolyl, anisyl, phenetyl. Z is $0 or m is l to Hill mole 'i and His ll) ni n'iole The radical R is selected {mm the group consisting of arylene radicals. such as o-s ni or p-phenylcne. naphthylene. anthrylehe. l .l .3-trimeth \'l-3 -phenylin dan-4'.5-diyl. substituted orunsubstituted \\i'tli radicals such as halogen. nitr o. cyano. allt yl ol' l to (1 carbon atoms. or alkoxy of l to- (icarbon atoms: arylencbi salkylene radicals where the alliylene portion comprises l to (1 carbon atoms. such as phenylenedimethy lenc. phenylenediethylcne. naphthylenedimcthylene. naphthylcncdiethylcne and the like. and cycloalkylene radicals. such as cyclopentylene. cyclohexylcne. nor bornylene. and the like, The radical R is preferably arylene.

The radical R is selected from the group consisting of alkylcne radicals of from Z to l2 carbon atoms. cycloalkylene. and arylene radicals such as o-. m. or pphenylcne. naphthylene anthrylenc. and 3.3.3'.3'- tetramethyl-Ll'-spirobilimlanl-ojV-diyl. It may also be represented by the formula I\':

wherein each R and R. which can be the same or different. are selected from the group consisting of hydrogen atoms. aryl radicals. such as phenyl. including substituted phenyl. halogen atoms. nitro radicals. cyano radicals. alkoxy radicals and the like. and wherein the substituents on the substituted phenyl may be a halogen atom. nitro radical. cyano radical or alkoxy radical. R" and R represent aliphatic. monocyclic or bicyclic radicals and can each be hydrogen atoms. alkyl radicals of l to (w carbon atoms including substituted alkyl radicals such as fluoromcthyl. difluoromethyl. trifluoromethyl. diehlorofluoromethyl. 2-[ 2.3 .4.5-tetrahydro-Z.2- dimethyl-4oxofur-3-yllethyl. and the like; cycloalkyl radicals of from 4 to 6 carbon atoms. such as cyclohexyl'. and aryl radicals having 6 to 20 carbon atoms. such as phcnyl. 3.4-dichlorophenyl. and 2.4- dichlorophenyl. R and R taken together with the carbon atom to which they are attached can represent a monocyclic. bieyclic or hetcrocyclie moiety having at least 4 atoms in the ring.

A very useful class of linear condensation polymers according to this invention that can be employed as flexible supports for photographic elements subjected to high temperature processing comprises polymers of recurring units having the formula V:

and Y is when X is S0 when is O. SO, -R-O when X is SO. and

when X is wherein each of- R..R*'. R and R. is as previously defined.

Another useful class of linear condensation polymers according to this invention that can be employed in the preparation of flexible supports for photographic elements subjected to high temperature processing is represented by the formula VI:

7 ,8 wherein X. Y. and R are as described hereinabove. Alternatively. thedesired 5.9-disulfonyl chloride is and R is preferably arylene. and n is an integer of from bmin d in l| m yjkl b r fl i g 7 7 1 5 to 98. preferably to 50. 7H-dibenzo -[c.h] tanthene- 5.9-di(potassium sulfoln formula Vl. the 7.7-dimcthyl-5.9-7 nate) with"phosphoryl chloride. Still another useful dibenzo[e.hl-xanthylene portion comprises from about 5 ro edure uffording goodyields of the 5.9-disulfonyl 20 to about 50 mole percent of the linear copolymcr. chloride comprises heating 7.7-dimethyl-7H- depending on the properties desired. In general. the dibcnzo[c.h]Xanthene-S .9 di( triQn-pcntylarnmonium higher the proportion of the 7.7-dimethyl-5.9-7-H- sulfonate) and phosphorus'pentachloride for about 5 dibenzo[c.h lxanthylene unit. the higher the glass tranhou at bo t 10() 1 16C sition temperature (Tg). I 10. As previously pointed'out. condensation polymers Bifunetional 7 7-di th ]-7H according to this invention comprise units derived from dibenzo[c.h lxanthenes useful in the practice of this inbisphenols. y ic 11nd polycyclic i lS and ulkylvention include the 5.9-diol. the 5.9-diacetate and the cne glycols. Thc bisphenols emplo'yed in this invention 5.9-disulfonyl chloride derivatives of 7.7-dimethyl-7H- are generally of the structure of formula VII:

VII

dibenzo[c.hIxanthene. These compounds can be pre- Where R. R R and R are defined hereinabove. pared by any method suitable for this purpose. A desir- Typical useful bisphenols include: Bisphenol A; 2.2-

able starting material is 7.7-dimethyl-7H- bis( 4-hydroxy-3.5-dichlorophcnyl lpropan l tetradibenzo[c.hlxanthenc which is made. for example. in chlorobisphcnol ll -ph ny -bis(4- accordance with the procedure of Sen-Gupta. .lourn. hydroxyphenyhethane; l-(3.4-dic hlorophenyl)-l.l- Chem. Soc., I914. page 401 by reacting l-naphthol s( y o yph y ne; 2.2-bis( and acetone in the presence of phosphoryl chloride at hydroxyphcnyl)-4-l -(2.3.4. I hy r -Z. about 100C for about l0 minutes. The 5.9diol is condimethyl-4-oxofuryl)jbutanel bis('4- veniently obtained. in the manner of Sen-Gupta and hydroxyphenyl)mcthun v 2l4-dichlorophenylbi Tucker said Journal. 557-568 (1922). by a two-step yd Q- yp c yl)-methanc; l.lhis(4-hydroxyphenyl)- process which comprises: l dichromate oxidation of yclohexancr' 1.1.1.3.3.3-hexafluoro-Z.Z- y l' 7.7-dimcthyl-7HdibenZolc.h]xanthene in a suitable 40 yphenyhpropanc; and diphenylbi l solvent such as glacial acetic acid; and (2) reduction of y r xyphcnyl )m th n the quinone intermediate with a conventional reducing SP Of i yp nomi ally ra tive agent. for example. zinc and glacial acetic acid. since they can generally be produced by the simple re- Novel monomers which result in particularly useful llctiOn t w ll H m as follo s:

R A if R -c o 12 H0 c-/ o:

I I 5 7 R5 polymers comprise 7,7-dimethyl7 H- Other useful bisphenols include lA-naphthalenediol; dibenzo[ c.hlxanthene 5.9-disulfonyl chloride. Conven- 2.5-naphthalenediol; bis(4-hydroxy-2-methyl-3- tional chlorosulfonation procedures can be employed propylphenyl)-methanc; 1.1-bis(2-ethyl-4-hydroXy-5- in making the 5.9-disulfonyl chloride derivative of 7,7- b t l h l h 3.2km 4 h d g p dimethyl-7H-dibenzolc.h]xanthene. For example. 1 5-tcrt.butylphenyl)propane; 1.1 '-bis(4-hydroxy-Z- mole of 7.7-dimethyl-7H-dibenzo [c.h]xanthene is methyl-S-isoctylphenyl)isobutanc and bis-l 2-ethyl-4- treated with 4 moles of chlorosulfonic acid. preferably hydroxyphenyl )-4 4-di-p-tolylmethane. Still other usein an inert solvent such as carbon disulfide. chloroform. ful bisphenols are disclosed in US. Pat. No. 3.030.335

carbon tetrachloride. and the like. The chlorosulfonic and Canadian Pat. No. 576.491.

acid is added at a rate sufficient to maintain the ambi' M ent temperature with external cooling. After stirring for Typical monoeyclic diols include hydroquinone and a period of about 30 minutes. the 5.9-disulfony'l chlohydroquinones substituted with alkyl groups of l to 15 ride derivative is isolated in the usual manner. carbon atoms or halogen atoms; resoreinol. unsubstituted or substituted with lower alkyl groups or halogen atoms. and the like; l.4-cyclohexancdiol; 1,.4- cyclohexanedimethanol; l.4-cyclohexanediethanolz l.- 4-his( Z-hydroxyethoxy )cyelohexane. v l .4- benzenedimethanol'. 1.4-bcnzenedicthanol. and the like. A

Exemplary alkylcne glycols include ethylene glycol; diethylene glycol; triethylene glycol; 1.2-propanediol; l.3-propanediol; l.4- butanediol; 2.3-butancdiol; 1.5- pentanediol; l.6-hexanediol; l.7-heptancdiol; L8- octanediol; 1.9-nonanediol; l.l-decanediol; 1.12- dodeeanediol; neopcntyl glycol; 2.2.4-trimethyll .6- hexanediol. and 4-oxa-2.o-heptanediol.

Diearboxylic compounds that can be employed to advantage in the practice of this invention include phthalic acid; isophthalic acid; tercphthalic acid: tbutylisophthalic acid; phenylenediacetie acid: phenylcnedipropionic acid; 2.6 -naphthalenedicarboxylic acid; l.4-naphthalenedicarboxylic acid; l.5- nephthalenediearboxylic acid; 1.7- naphthalenedicarboxylic acid; 4.4'-diphenic acid; 4.4- sulfonyldibenzoic acid; 4.4'-oxydibenzoic acid; binaph thyldicarboxylic acid; 4.4'-stilbc'nedicarboxylic acid. and 9.l(l-triptycenedicarboxylic acid.

Although the dicarboxylic acids useful in the practice of this invention can be employed in the free acid form. it is often more advantageous to utilize a bifunctional derivative thereof. For example. the corresponding acid anhydrides may be used where they are available. Other useful bifunctional equivalents include the lower monohydric alcohol and phenyl esters of dicarboxylic acids and the dicarboxylic acid halides. e.g. the chlorides or bromides.

The molecular weight of the linear condensation polymers of this invention can vary over wide ranges. although we have found that polymers having a molecular weight of at least 10,000 are useful. Linear poly merie compounds having molecular weight from about l5.000 to 50,000 are particularly desirable. The compounds of this invention are further characterized by their inherent viscosities. Generally. the subject filmforming polymers have an inherent viscosity of about 0.4 to about 1.2 and the polymers preferred as supports for photographic elements processed at high temperatures have an inherent viscosity of about 0.6 to about 0.8. The inherent viscosities herein reported are measured at C at a concentration of 0.25g. of polymer per 100 ml. of solution. Unless otherwise specified. a solution of equal parts by weight of phenol and chlorobenzene is employed.

The glass transition temperatures of the polymers of this invention can be determined by differential scanning calorimetry as disclosed in The DSC Cell and Accessories Instruction Manual for the 900 Thermal Analyzer and Modules." sold by E. l. duPont de Nemours Instrument Products Division.

Film-forming as used in this invention refers to a material which will provide a self-supporting film of the material when cast or extruded. for example. when cast in sheets of from 1 to 7 mils thickness.

It is appreciated. of course. that the physical properties of the broad class of novel polymers of this invention such as. for example. the glass transition temperature (Tg). yield strength. breakstre'ngth.'Youngs modulus and the like. can bevaricd over a 'wide range. Polymers with'properties in a particular range can be easily obtained by judicious selectionof appropriate diol diamine or disulfonyl chloride components. The proper choice and proportions of the monomeric components can be determined by test procedures well known to those skilled in the art of making condensation polymers.

A useful class of polysulfonamides according to this invention comprises units of a diamine condensed with a disulfonyl halide units comprising from about 25 to about mole percent 7.7-dimethyl-7H- dibenzo[c.h lxanthene-S.9-disulfonyl chloride units and from about 75 to about 25 mole percent dissimilar disulfonyl chloride units. These polymers contain recurring residues of a 7.7-dimethyl-7H- dibenzo[ c.h Ixanthenc having 5 .9-bis-sulfonamido groups.

Examples of diamines which may be used to condense with disulfonyl halide units herein are:

0.111. and p-phcnylencdiaminc 2.-l-diaminotolucne 2.5-diaminotolucne lo-diaminotolucne 3.J-diaminotoluene I.3-diaminofluorcne 2.5-diaminolluorcne I.7-diaminolluorcnc l.Z-diaminonaphthalenc l.5-diaminonaphthalcnc l.8-diaminonaphthalene 2.3-diaininonaphthalenc A very valuable class of polymeric polysulfonates of this invention comprises units of a bisphenol condensed with disulfonyl halide units comprising from about 25 to about 75 mole percent 7.7-dimethyl-7H- dibenzo[ c.h ]xanthene5.9-disulfonyl chloride units and from about 75 to about 25 mole percent dissimilar disulfonyl chloride units.

Compounds having two sulfonyl halide groups that are useful in the practice of the invention include o-. m-. and p-benzencdisulfonyl chloride; 4.4- bephenyldisulfonyl chloride; 4.4'-biphenyletherdisulfonyl chloride. and the naphthalenedisulfonyl chlorides wherein the two sulfonyl chloride groups are attached at the 1.2. the l.3. the l.4. the 1.5. the 1.6. the L7. the 2.6. and the 2.7 positions respectively.

A highly desirable class of polymeric polyesters in accordance with this invention comprises units of terephthalie acid esterified with diacetate units which comprise from about 20 to about mole percent 7.7- dimethyl-7H-dibenzolc.h lxanthene5.9-diacetate units and from about 80 to about 20 mole percent bisphenol diacetate units.

As indicated hereinabove. the preferred linear condensation polymers of this invention include polysulfonamides. polysulfonates. polyesters and polyesterpolysulfonate units. Other polymers may include polyurethanes. polyimides and the like. Generally any procedure known in the art for making linear condensation polymers can be used for preparing these polymers. The following are examples of processes that may be utilized to produce linear polymers of this invention.

a. The interfacial procedure can be utilized to make the polymers. A preferred embodiment with regard to the materials. solvents and catalysts is shown in Example 3. The preferred timeof reaction is a function of all other variables and. as such. is governed by the viscosity desired for the polymer. Generally. the reaction can be monitored by sampling and thus the preferred poly merization time chosen. A variety of solvents may be employed to provide a broader range of reaction temperatures and solubilities as desired. Suitable solvents include methylene chloride. chloroform. carbon tetrachloride and the like.

b. Polymers according to this invention can be prepared by a solution procedure whereby a bifunctional derivative of 7.7-dimethyl-7H-dibenxolc.hlxanthenc. for example. the 5.9-disulfonyl chloride. and the 'co rcactant(s). for example an alkylene diamine. are placed in solution in the presence of an acid acceptor such as. for example. pyridine. The acid acceptor can be present in excess and thus serve also as a solvent.

c. The ester interchange procedure of synthesizing polymeric esters both by the melt process and the powder process can advantageously be used to make the polymers of this invention. particularly for those copolymers which can be crystallized. Example 1 l is illustrative of this technique. This procedure affords flexible film-forming polymers having improved physical properties including high softening temperatures and high molecular weights. The melt process is advantageously conducted in the presence of a catalytic agent. Useful catalysts for the transesterification reactions include the carbonate. oxide. hydroxide. hydride and alkoxide of an alkali metal or an alkaline earth metal. a compound of a Group IVA metal of the Periodic Table. e.g.. titanium isopropoxide. organometallic halides and complex alkoxides such as NaHTi(OC,H,,) and the like.

The film-forming materials of this invention can be generally extruded or cast into flexible supports and used in various layer arrangements and structural combinations. Generally. the flexible supports of this invention are treated by any convenient method to improve the adhesion ofsuperimposed coatings or layers. Useful procedures include subbing with conventional subbing agents for polymer supports. contacting with a chemical agent such as sulfuric acid. corona discharge. treating with a reactive gas according to the procedure of Lidel. U.S. Ser. No. 80.482. filed Oct. 13. 1970 and Belgian Pat. No. 736.993. and the like. The filmforming polymers of this invention are used to advantage as flexible supports for photographic silver halide and other light-sensitive systems as well as for multilayer elements used in color photography and diffusion transfer processes.

In a preferred embodiment. a support of a polymer of this invention is used as the film support in photographic elements which are heat-processed or heatstabilized. In particular. one preferred embodiment relates to photographic elements comprising the supports of this invention having at least one layer of a photographic emulsion which contains silver halide grains having polyvalent ions occluded therein as disclosed in Bacon et al.. US. Pat. No. 3.447.927. Elements of this type can be processed according to Colt. U.S. Pat. No. 3.418.122. issued Dec. 24. 1968.

The following examples illustrate the preparation of the polymers of this invention.

EXAMPLE l Preparation of 7.7-Dimethyl-7H-dibenzol c.h ]xanthenc-5.9- di( potassium sulfonatc) Chlorosulfonic acid. 42 ml..(75g.. 0.644 mole) is added to a solution of 50g. (0.161 mole) of 7.7- dimethyl-7H-dibenzolc.hlxanthene in 250 ml. of chloroform over a 10 minute period with external cooling to maintain a reaction temperature of 10 to 30C. The insoluble complex is collected and washed well with chloroform. This solid is then added to a solution of 56g. 1.0 mole) of potassium hydroxide in 500 ml. of ethanol. The white solid which forms is collected. washed with ethanol and dried. The dried solid is slurried in 1.0 liter of boiling ethanol. collected and dried again. The yield of solid is 955g; m.p. is above 300C.

The IR. spectrum and the NMR spectrum indicate that the product comprises 7.7-dimcthyl-7H- dibenzo[c.h]xanthene-5.9-di(potassium sulfonate) and a small amount of inorganic potassium salts.

EXAMPLE 2 Preparation of 7.7-Dimethyl-7H-dibcnzo[ c.h lxanthene-S .9-disulfonyl chloride Forty g. of the product obtained in Example 1 is treated with 200 ml. of refluxing phosphoryl chloride for 16.5 hours. The mixture is then poured into ice water and the solid collected and washed with water. The damp material is then recrystallized from 1.5 liters of methyl ethyl ketone with decolorizing carbon. The yield of 7.7-dimethyl-7H-dibenzo-lc.h]xanthene-5.9 disulfonyl chloride is 5.7g. 16.7 percent based on 7.7- dimethyl-7H-dibenzolc.hlxanthenc): mp=278280C (decomposition). The second crop yield. after concentrating to one half volume. is 5.1g. 14.9 percent based on 7.7-dimethyl-7H-dibcn7.o[c.hl-xanthene); mp=276278C (decomposition The NMR and IR. spectra of the first crop material support the proposed structure.

A repetition of the immediately described procedure affords a combined first and second crop yield of EXAMPLE 3 Polymerization of 7.7-Dimethyl-7H-dibcnzo[c.h]-xanthene-5.9- disulfonyl chloride and 1.6-Hexanediamine. lnterfacial Process In a blender is placed 0.58g. (0.005 mole) of 1.6 hcxanediamine. 1.05g. (0.010 mole) of sodium carbonate. 50 ml. of distilled water and 4 ml. of a twenty percent solution of Duponol ME (sodium lauryl sulfate.

manufactured by E. l. du Pont de Nemours Co.) in water. To this stirred solution is added a solution of 2.53g. 0.005 mole) of 7.7-dimethyl-7H-dibenzolc.hIxanthene-S.9-disulfony1 chloride. prepared in the manner of Example 2. in 100 ml. of chloroform. The mixture is stirred for 35 minutes. At this time. the mixture is poured into 1400 ml. of methanol precipitating the polymer. The polymer is collected and dried. The inherent viscosity is 0.35 and the Tg is 206C.

The procedure of Example 3 is repeated except that the 1.6-hexancdiamine is replaced by equivalent amounts of other diamines. The compounds employed and the physical properties of the resultant polymers are-set out in Table l below.

Table l I Inherent Example Diamine viscosity 'l'g( '1') 4 H. .N(H (H NH. 0.2-1 270 5 o..-l 301 7 H. .N((.H. .)..NH. o TR 200 EXAMPLE 8 Polymerization of 7 .7-Dimethyl-7H-dihenzo[ c.h I-xanthene-S .9- disulfonyl Chloride and l.(i-Hexanediamine. Solution Process ill is then poured into 1500 ml. of 4:1 methanolzwater.

and the polymer is collected and dried. The inherent viscosity is 0.17.

EXAMPLE 9 Polymerization of 7.7-Dimethy1-7H-dihenzo[ c.h lxanthene-S.9-disulfonyl Chloride and 4.4'-lsopropylidenediphenol. lnterfacial Process In a blender is placed 1.14g. (0.005 mole) of 4.4- isopropylidenediphenol. 22 ml. (0.01 1 mole) of0.5 N NaOH. 28 ml. of distilled water and one drop of tri-nbutylamine. To this solution is added a solution of 2.5 3g (0.005 mole) of 7.7-dimethyl-7H- dihen7.o[c h]xanthene-5.9-disulfonyl chloride in 150 ml. of methylene chloride. The mixture is stirred for two hours and forty-five minutes adding 50 ml. of 1.2- dichloroethane after 1 hour and minutes of reaction. At the end of this time. 5 ml. of acetic acid is added and the mixture is poured into 1400 ml. of methanol. The polymer is collected and dried at 50C for 17 hours. The inherent viscosity in chloroform is 0.07 and the Tg is 220C.

EXAMPLE 10 Polymerization of 7.7-Dimcthyl-7H-dihenzo[c.h1xanthene-S.9-disulfonyl Chloride. l.3-Benzenedisulfonyl Chloride and 4.4'-lsopropylidenediphcnol. 50:50 lntertacial Process In a blender is placed 228g (0.01 mole) of 4.4- isopropylidenediphenol. 44 ml. (0.022 mole) of 0.5 N NaOH. 56 ml. of distilled water and two drops of tri-nbutylamine. To this solution is added a solution of 253g. (0.005 mole) of 7.7-dimethyl-7H- dibenzolc.hlxanthcnc-5.9-disulfonyl chloride and 1.37g. (0.005 mole) of l.3'henzenedisultonyl chloride in 100 ml. of chloroform. The mixture is stirred for 3 hours and minutes. After l hour and minutes of reaction. ml. of additional chloroform is added. After completion of this stirring. 5 ml. of acetic acid is added and the mixture is poured into 1500 ml. ot'methanol. The polymer is collected and dried at 50C for 17 hours. The inherent viscosity in chloroform is 0.1 l and the Tg is 160C.

EXAMPLE 1 1 Polymerization of 7.7--Dimethyl-7H-dibenzol c.h |-.\anthene5.9- diaeetate. 2.2-Bis( p-acetoxyphenyl )-propane and Terephthalic Acid. 30:70 Melt Process in a polymer flask equipped with a nitrogen inlet tube. and a Vigreux-Claissen adapter is placed 060g. (0.0014 mole) of 7.7-dimethyl-7H-dibenzo[c.hlxanthene-5.9-diacetate. 1.03g. (0.0033 mole) ot2.2-bis(pacetoxyphenyl)propane. 078g. (0.0047 mole) of terephthalic acid and a catalytic amount of dihutyltin oxide. With nitrogen bubbling through the reaction mixture. the flask is heated from 265C to 300C over a one and one-half hour period. The polymer is then isolated. ground to a powder and heated in a polymer flask at 300C at 0. 10 mm pressure for three hours. The polymer is then removed from the reaction flask. The in herent viscosity is 0.60 and the Tg is 299C.

EXAMPLE 1?.

Preparation of Bis( 4-carhomethoxyphenyl 7.7-dimethyl-7H-dihenzo[ c.h lxanthene-S .9- disulfonate A mixture of 50.7g. (0.10 mole) of 7.7-dimethyl-7H- dihenzo[c.h]xanthene-5.9-disulfonyl chloride. 304g. (0.20 mole) of methyl 4-hydroxyhenzoate and 500 m1. of pyridine is stirred at reflux for 1.5 hours. The solution is then concentrated to dryness. The solid residue is dissolved in 500 ml. of chloroform and washed with two portions of water. The organic layer is dried over sodium sulfate. filtered and concentrated to an oil. This oil is dissolved in 250 ml. of methyl ethyl ketone. diluted further with 250ml. of methanol. treated with decolorizing carhon. filtered and cooled. The crystals are collected. dried and recrystallized again from 300 ml. of methyl ethyl ketone giving 128g 17.3% of his( 4-carhomethoxyphenyl) 7.7-dimethyl-7H- dihenzol c.h lxanthene-S.9-disulfonate; m.p.=209 210.5C.

EXAMPLE l3 Polymerization of Bis( 4-earbomcthoxyphenyl) 7.7-Dimethyl-7H-dihenzolc.h ]xanthene-5.9- disulfonate and Ethylene Glycol A mixture of 6.40g (8.67 X 10" mole) of his(4-ear homethoxyphenyl) 7.7-dimethyl-7H- dihenzolc.hlxanthene-5.-)-disulfonate and 2.00g (3.22 X 10* mole) of ethylene glycol is treated with a catalytic amount of zinc acetate dihydrate and antimony (Ill) oxide for 1.5 hours in a polymer flask equipped with a nitrogen addition tube and Vigreux-Claissen adapter. During this time. the mixture is heated from 240C to 287C. The nitrogen tube is then removed. stirring is initiated and the system is evacuated to 0.50 mm. This reduced pressure and stirring is maintained for 3 hours. The polymer is then cooled and isolated. Inherent Viscosity is 0.47 and Tg is C.

EXAMPLE 14 Polymerization of Bis( 4-carbomcth0xyphenyl) 7.7-Dimethyl-7Hdibenzo[e.h]xanthene-5.9- disulfonate and l.4-Cyclohexanedimethanol This polymer is prepared in the manner of Example l3 from a mixture of 6.4(lg (8.67 X ll) mole) of bist 4-carbomethoxy-phenyl) 7.7-dirneth vl-7l-ldiben7.o[c.h lxanthene-5.Q-disultlmate and 150g. l.73 X l()" mole) of l.4-cyclohexanedimethanol and employing a catalytic amount of zinc acetate dihydrate and antimony (lll) oxide. lnherent viscosity is 0.24 and Tg is 191C.

it has been mentioned previously that the condensation polymers of this invention are employed to advantage in the preparation of flexible films. Certain of these films. prepared from polymers of this invention that have glass transition temperatures above about 200C. and preferably above 220C. are especially useful as flexible supports for photographic elements that are processed at high temperatures.

A convenient procedure for converting a polymer of this invention to film form is the well-Known method of solvent casting. although other commonly used methods such as extrusion may be employed. Film formation by solvent casting and the preparation of a photographic product for high temperature processing are typically illustrated by Examples 15 and lo respectively.

EXAMPLE l A solution in It) ml. of tetrahydrofuran of 1.7g. of polysulfonamide polymer prepared from 7.7-dimethyl- 7H-dibenzo-l c.h lxanthene-S.J-disulfonyl chloride and l.(w-hexanediamine in the manner of Example 3 and having an inherent viscosity of 0.48 is filtered through diatomaceous earth. The clear filtrate is then coated on a Teflon-covered glass plate and allowed to dry at room temperature for seventeen hours and then at 50C for 47 hours. A clear amorphous self-supporting film of 4.5 mils thickness is formed. 1

EXAMPLE 16 A strip of the film prepared in Example is treated according to the procedure of Lidel referred to hereinabove. to promote adhesion of the photographic emulsion that is applied in the next step. The treated strip is coated with a light-sensitive printout emulsion prepared aecording to the procedure of Bacon referred to hereinabove. The emulsion coating has a thickness of 4 mils. The dried. coated silver halide emulsion adheres well to the treated film support as evidenced by a cellophane tape test.

In this test. the dry coated emulsion layer is scored in a cross-hatch pattern and a piece of cellophane tape is pressed firmly over the scored area. The tape is then stripped quickly from the film. If the bond between the emulsion layer and film is strong. the emulsion layer is not removed from the film by the tape. A weak bond facilitates removal of the emulsion layer by the tape.

It will be apprccited that any conventional procedure for promoting adhesion of a photographic emulsion could be used. 'lypical procedures include corona treatment. chemical treatment. suitable subbing layers. and the like.

Films prepared from the linear condensation polymers of this invention are highly useful as flexible supports for pl iotographic silver halide emulsions which must be processed at elevated temperatures. Similarly. films prepared from the polymers of this invention can be employed as flexible supports for light-sensitive photographic elements that are processed solely by the application of heat. The polymers of this invention find further use as supports for light-sensitive colloid layers such as are employed in image transfer processes. in lithography. and the like. The high temperature characteristics and dimensional stability of the subject polymers make them suitable as supports for photoresists such as these utilized in the preparation of printed circuits. and the like. Additionally. the polymeric compositions of this invention can be solvent cast. extruded or molded and are therefore useful as fibers, as components of tire cord. lacquers. molding resins. engineering plastics and the like. i i I Polymeric compositions according tothis invention are advantageously prepared by standard techniques using well-known industrial processes. The compounds employed in making the polymers of this invention are prepared from readily available. inexpensive materials. A further advantage of the polymers of this invention is that they may be readily formed into film using procedures compatible with commercially available equipmerit. l

The invention has been described in detail with par-. ticular reference to preferred embodiments thereof. but it will be understood that variations and modifications can be effected within the spirit and scope of the invention.

We claim:

1. A photographic element comprising a photographic emulsion Coated on a film of a linear homopolymer or copolymer of a 7.7-dimethyl 5.9-7H- dibenzolc.h]-xanthylene group. I

2. A photographic element comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula:

whcrein X is SO: or

0 so. c;

Y is

R R l l when X is 7. is S(). or

m is l to 100 mole percent and n is l()(l-m mole percent: R is a radical selected from the group consisting of alkylene radicals of from 2 to l2 carbon atoms. cycloalkylenebisalkylene radicals and ar \lenebisalk 'lene radicals; each R which can be the same or different is a radical selected from the group consisting of hydrogen atoms, alkyl radicals of from l to 4 carbon atoms. aralkyl radicals. aryl radicals and tolyl. anisyl. and phenethyl radicals; each R". which can be the same or different. is a radical selected from the group consisting of cycloalkylene radicals. arylene radicals. substituted arylene radicals wherein the substituents are halogen. nitro. cyano. alkoxy of l to 6 carbon atoms and alkyl radicals of l to 6 carbon atoms. and arylenebisalkylene radicals having 1 to 6 carbon atoms in the alkylene portion. and each R. which can be the same or different. is a radical selected from the group consisting of alkylcne radicals of from 2 to 10 carbon atoms. cycloalkylene. arylene radicals. and substituted arylene radicals wherein the substituents are halogen. nitro. cyano. alkyl of l to 6 carbon atoms. and alkoxy of l to 6 carbon atoms.

3. The photographic element of claim 2 wherein R" is represented by the formula:

wherein each R and R''. which can be the same or different. are selected from the group consisting of hydrogen atoms. ar \'l radicals. halogen atoms. nitro radicals. cyano radicals. alkoxy radicals and substituted phenyl wherein the substituents can be halogen. cyano. nitro and alkoxy. and R and R are selected from the group consisting of hydrogen atoms. alkyl radicals of from 1 to 6 carbon atoms. fluoromethyl. difluoromethyl. trifluoromethyl. dichlorofluoromethyl. 2-[ 2.3.4.5- tetrahydro-2.Z-dimethyl-4-oxofur-3-yllethyl radicals. cycloalkyl radicals..and aromatic radicals of from 6 to 20 carbon atoms.

4. The photographic element ofclaim 2 wherein X is SO...

graphic emulsion coated on a film of a polymer having recurring units having the formula:

wherein R is a radical selected from the group consisting of cyeloalkylene radicals. arylenc radicals. substituted arylene radicals. wherein the substituents are halogen. nitro. cyano. alkoxy of l to 6 carbon atoms and alkyl radicals of l to 6 carbon atoms. and arylenebisalkylene radicals having 1 to 6 carbon atoms in the alkylene portion; each R. which can be the same or different is a radical selected from the group consisting of alkylene radicals of from 2 to 10 carbon atoms. cyeloalkylene. arylene radicals. and substituted arylene radicals wherein the substituents are halogen. nitro. cyano. alkyl of l to 6 carbon atoms. and alkoxy of l to 6 carbon atoms; In is l to l()() mole percent and n is l()()-m mole percent.

8. A photographic element comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula:

l(). A photographic clement comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula:

graphic emulsion coated on a film of a polymcr comprising rccurring units having the formula:

o O .5 d

mole percent.

11. A photographic element comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula:

. wherein R is a radical selected from the group consisting of alkylene radicals of from 2 to 12 carbon atoms. mole percent.

cycloalkylenchisalkylenc radicals and arylenchisalkylcnc radicals. 

1. A PHOTOGRAPHIC ELEMENT COMPRISING A PHOTOGRAPHC EMULSION COATED ON A FILM OF A LINEAR HOMOPOLYMER OR COPYLMER OF A 7,7-DIMETHYL 5,9-7H-DIBENZOL (C,H)-XANTHYLENE GROUP.
 2. A photographic element comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula:
 3. The photographic element of claim 2 wherein R3 is represented by the formula:
 4. The photographic element of claim 2 wherein X is SO2.
 5. A photographic element of claim 2 wherein X is O.
 6. The photographic element of claim 2 wherein X is
 7. A photographic element comprising a photographic emulsion coated on a film of a polymer having recurring units having the formula:
 8. A photographic element comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula:
 9. A photographic element comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula:
 10. A photographic element comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula:
 11. A photographic element comprising a photographic emulsion coated on a film of a polymer comprising recurring units having the formula: 